2023년 6월 13일 업데이트됨
Madani Labed*, Ji Young Min, Eun Seo Jo, Nouredine Sengouga, Chowdam Venkata Prasad, You Seung Rim*
"Reduction of Fermi-level pinning and controlling of Ni/β-Ga₂O₃ Schottky barrier height using an ultrathin HfO₂ interlayer"
ACS Applied Electronic Materials, Accept (2023) (IF 4.494)
Congratulation!