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ACS Applied Electronic Materials Accepted

  • 작성자 사진: ISLAB
    ISLAB
  • 2023년 6월 12일
  • 1분 분량

최종 수정일: 2023년 6월 13일

Madani Labed*, Ji Young Min, Eun Seo Jo, Nouredine Sengouga, Chowdam Venkata Prasad, You Seung Rim*

"Reduction of Fermi-level pinning and controlling of Ni/β-Ga₂O₃ Schottky barrier height using an ultrathin HfO₂ interlayer"

ACS Applied Electronic Materials, Accept (2023) (IF 4.494)


Congratulation!



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© Intelligent Semiconductor Laboratory 2016, Sejong University, 209, Neungdong-ro, Gwangjin-gu, Seoul 05006, Korea

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